BLANK MASK AND PHOTOMASK USING THE SAME
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United States of America Patent
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Issued Date -
Jul 6, 2023
app pub date -
Dec 30, 2022
filing date -
Dec 31, 2021
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Abstract
A blank mask includes a transparent substrate and a light shielding film disposed on the transparent substrate. A surface of the light shielding film has a controlled power spectrum density value at a spatial frequency of 1 μm−1 to 10 μm−1. The surface of the light shielding film has a controlled minimum power spectrum density value at the spatial frequency of 1 μm−1 to 10 μm−1. An Rq value of the surface of the light shielding film is 0.25 nm to 0.55 nm.
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