METHOD FOR FABRICATING A MICRO RESISTANCE LAYER AND METHOD FOR FABRICATING A MICRO RESISTOR
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United States of America Patent
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Issued Date -
Jun 29, 2023
app pub date -
Mar 15, 2022
filing date -
Dec 28, 2021
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Abstract
A method for fabricating a micro resistance layer and a method for fabricating a micro resistor are provided. The method for fabricating a micro resistance layer includes: providing a substrate; forming a first resistance layer on the substrate by using a screen printing process or a sputtering process; dividing the first resistance layer into second resistance layers, wherein each one of the product regions includes a second resistance layer, and an area of each one of the product regions is smaller than 0.4*0.2 mm2; and trimming the second resistance layer of each one of the product regions according to a predetermined resistance value to enable the pattern of each one of the second resistance layers to correspond to the predetermined resistance value. The method for fabricating a micro resistor uses the method for fabricating a micro resistance layer for fabrication of the micro resistor.
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