METHOD OF INSPECTING TIP OF ATOMIC FORCE MICROSCOPE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

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United States of America Patent

APP PUB NO 20230194567A1
SERIAL NO

17878414

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Abstract

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A method of operating an atomic force microscope (AFM) is provided. The method includes inspecting a sample by using the AFM and inspecting a tip of a probe of the AFM by using a characterization sample. The characterization sample includes a first characterization pattern that includes a line and space pattern of a first height, a second characterization pattern that includes a line and space pattern of a second height that is lower than the first height, and a third characterization pattern that includes a line and space pattern of a third height that is lower than the second height, and includes a rough surface.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY291 DAEHAK-RO YUSEONG-GU DAEJEON 34141

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hong, Seungbum Daejeon, KR 20 304
Kim, Hoon Daejeon, KR 562 7664
Kim, Kwangeun Suwon-si, KR 9 1
Kim, Souk Seoul, KR 17 10
Ryu, Sungyoon Seoul, KR 14 3
Sohn, Younghoon Seoul, KR 33 28
Yang, Yusin Seoul, KR 27 53
Yeom, Jiwon Daejeon, KR 3 0
Yun, Seokjung Daejeon, KR 12 151

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