CHEMICAL POLISHING BATH FOR ALUMINUM AND ALUMINUM ALLOYS, AND METHOD USING SUCH A BATH
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United States of America Patent
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Issued Date -
Jun 22, 2023
app pub date -
May 19, 2021
filing date -
May 20, 2020
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Abstract
A chemical polishing bath for polishing a part made of aluminum or of aluminum alloy, or a portion of such a part, which bath includes an oxidizing agent capable of attacking the aluminum, chosen from nitric acid, hydrogen peroxide, permanganate, or a mixture thereof, at a concentration between 1.2 and 3.0 mol/L. The polishing bath also includes a fluoride complexing agent capable of forming a complex with the oxidized aluminum, at a concentration between 0.3 and 1.6 mol/L; a catalyst (Cu); and phosphoric acid at a concentration between 10.10 and 14.30 mol/L and also sulfuric acid at a concentration between 1.50 and 3.60 mol/L. The bath is particularly suitable for polishing parts resulting from additive manufacturing (3D printing).
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