APPARATUS FOR INSPECTING DROPLET AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
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United States of America Patent
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Issued Date -
Jun 8, 2023
app pub date -
Nov 18, 2022
filing date -
Dec 2, 2021
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Abstract
An apparatus for inspecting a chemical solution of the present invention comprises a base unit having an inlet, through which a chemical solution is introduced, a flow path unit, in which the chemical solution introduced through the inlet is moved while a velocity of its fluid is changed, and including a first region unit provided adjacent to the inlet of the base unit and a second region unit being in series communication with the first region unit, in which the chemical solution discharged from the first region unit is moved, a detecting unit including a first detecting member for detecting a first signal that is an electrical signal of the first region unit, and a second detecting member for detecting a second signal that is an electrical signal of the second region unit, and a determining unit for receiving a signal from the detecting unit and determining that a particle and a bubble are detected if a current of the first signal and the second signal is changed compared to a reference value, and discriminating and determining a particle and a bubble according to a difference in a current between the first signal and the second signal or a time difference, in which a current is changed.
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