LAMINATE FOR BLANK MASK AND MANUFACTURING METHOD FOR THE SAME
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United States of America Patent
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Issued Date -
Jun 1, 2023
app pub date -
Nov 28, 2022
filing date -
Nov 29, 2021
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Abstract
A laminate for a blank mask includes a light-transmitting layer; a phase shift film disposed on the light-transmitting layer; and residual ions measured from a surface of the phase shift film through ion chromatography comprises at least one of sulfate ions in a concentration of 0 ng/cm2 to 0.05 ng/cm2, nitric oxide ions in a concentration of 0 ng/cm2 to 0.5 ng/cm2, or ammonium ions in a concentration of 0 ng/cm2 to 5 ng/cm2, or any combination thereof. A sum of concentrations of the residual ions is more than 0.
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