LITHOGRAPHY SYSTEM
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United States of America Patent
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Issued Date -
May 4, 2023
app pub date -
Jun 30, 2022
filing date -
Nov 3, 2021
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Abstract
A lithography system includes: a lithography device; and a mask adapted to the lithography device and having an exposed area and a non-exposed area surrounding the exposed area. The mask includes: a device pattern, arranged in the exposed area and configured to be projected onto photoresist covering a semiconductor structure during exposure; and an Electrostatic Discharge (ESD) ring, arranged in the exposed area and surrounding the device pattern. The ESD ring has a feature size less than a resolution of the lithography device. There is a preset spacing between the ESD ring and the device pattern.
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