High efficiency plasma creation system and method
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United States of America Patent
Stats
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Dec 26, 2023
Grant Date -
Apr 27, 2023
app pub date -
Dec 27, 2021
filing date -
Mar 22, 2021
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A chamber cross-sectional multi-stage plasma arrangement characterized by escalating charge movement towards chamber center axis through one or more escalation stages contributing to the heating of the plasma, the centering of the plasma on the chamber axis, and creating rotation of the plasma therein. Rotation of the plasma around its axis induces a self-generated magnetic field, which in turn increases plasma stability and confinement. Some of the said stages of the multi-stage arrangement may be created by physical elements and components while others may be induced or generated by externally applying magnetic and/or electric fields or their combinations and/or by injection of electrons, ions or other plasma.
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International Classification(s)
- 2021 Application Filing Year
- H05H Class
- 291 Applications Filed
- 130 Patents Issued To-Date
- 44.68 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H05H Class
- 0 % this patent is cited more than
- 2 Age
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