LASER PROCESSING HEAD HAVING CONTAMINATION RESISTANCE
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United States of America Patent
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Issued Date -
Mar 30, 2023
app pub date -
Sep 24, 2021
filing date -
Sep 24, 2021
priority date (Note) -
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status (Latency Note)
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Abstract
A laser processing head for directing a laser beam includes two reflectors and a sole lens element. The first reflector disposed in a housing's interior reflects the laser beam from a source to the second reflector, which then reflects the laser beam toward a process zone for a workpiece. The single lens element is disposed in the housing's interior between the reflectors. The lens element can be moved to adjust a focal position of the laser beam beyond the housing's outlet. To reduce contamination, one or more nozzles are configured to direct purge gas across one or more of the first reflector, the second reflector, and the lens element, while one or more collection areas disposed in the interior are configured to collect contamination directed from the purge gas.
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