Lithographic systems and methods of operating the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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Mar 5, 2024
Grant Date -
Mar 30, 2023
app pub date -
Dec 5, 2022
filing date -
Dec 5, 2022
priority date (Note) -
In Force
status (Latency Note)
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Importance

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Non-US Coverage
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Abstract
A lithographic system for projecting an image onto a workpiece using radiation is provided. The lithographic system includes: a support structure for supporting a workpiece; a radiation source for providing radiation to project an image on the workpiece; a reticle positioned between the radiation source and the workpiece; and a mask positioned adjacent the reticle, the mask being configured to block radiation from the radiation source, the mask including a heat removal apparatus.
First Claim
all claims..Other Claims data not available
Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
KR | A | KR20210149168 | Feb 26, 2020 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
UNEXAMINED PATENT APPLICATION | 리소그래피 시스템 및 그 작동 방법 | Dec 08, 2021 | |||
US | B2 | US11550232 | Feb 26, 2020 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT AS SECOND PUBLICATION | Lithographic systems and methods of operating the same | Jan 10, 2023 | |||
WO | A1 | WO2020207656 | Feb 26, 2020 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
INTERNATIONAL APPLICATION PUBLISHED WITH INTERNATIONAL SEARCH REPORT | LITHOGRAPHIC SYSTEMS AND METHODS OF OPERATING THE SAME | Oct 15, 2020 | |||
CN | B | CN113767335 | Feb 26, 2020 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT FOR INVENTION | Lithographic system and method of operating the same | Jan 14, 2025 | |||
EP | A1 | EP3953766 | Feb 26, 2020 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
APPLICATION PUBLISHED WITH SEARCH REPORT | LITHOGRAPHIC SYSTEMS AND METHODS OF OPERATING THE SAME | Feb 16, 2022 | |||
TW | B | TWI853899 | Mar 04, 2020 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT OR PATENT OF ADDITION | LITHOGRAPHIC SYSTEMS AND METHODS OF OPERATING THE SAME | Sep 01, 2024 | |||
US | B2 | US11947271 | Dec 05, 2022 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT AS SECOND PUBLICATION | Lithographic systems and methods of operating the same | Apr 02, 2024 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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KULICKE & SOFFA LITEQ B V | 5633 AE EINDHOVEN |
International Classification(s)

- 2022 Application Filing Year
- G03F Class
- 1894 Applications Filed
- 526 Patents Issued To-Date
- 27.78 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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de, Boeij Jeroen | 's-Hertogenbosch, NL | 8 | 32 |
# of filed Patents : 8 Total Citations : 32 | |||
Loktev, Mikhail Yurievich | Valkenswaard, NL | 5 | 2 |
# of filed Patents : 5 Total Citations : 2 |
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Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 1 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Sep 5, 2027 |
7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Sep 5, 2031 |
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Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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