BLANK MASK AND PHOTOMASK USING THE SAME
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United States of America Patent
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Issued Date -
Mar 16, 2023
app pub date -
Aug 30, 2022
filing date -
Sep 3, 2021
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Abstract
A blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface of the light shielding film has a first contact angle of 40° to 45° measured by using diiodo-methane as a first liquid contacting the surface of the light shielding film, is disclosed.
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