METHOD OF FABRICATING METAL MASK AND METAL MASK
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United States of America Patent
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Issued Date -
Mar 2, 2023
app pub date -
Dec 10, 2021
filing date -
Aug 26, 2021
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Abstract
A method of fabricating a metal mask includes receiving a metal planar substrate and patterning the metal planar substrate. The metal planar substrate includes a first surface and a second surface opposite to the first surface. The patterning the metal planar substrate includes forming strip-shaped structures, forming through holes, and forming a blind hole in a direction from the first surface to the second surface. The through holes extend to the first surface and the second surface. The through holes and the strip-shaped structures are alternately arranged. The blind hole extends across the through holes.
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