Method of using processing oven

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United States of America Patent

PATENT NO 11850672
APP PUB NO 20230060603A1
SERIAL NO

17872320

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Abstract

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A method of using a processing oven may include disposing at least one substrate in a chamber of the oven and activating a lamp assembly disposed above them to increase their temperature to a first temperature. A chemical vapor may be admitted into the chamber above the at least one substrate and an inert gas may be admitted into the chamber below the at least one substrate. The temperature of the at least one substrate may then be increased to a second temperature higher than the first temperature and then cooled down.

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Patent Owner(s)

  • YIELD ENGINEERING SYSTEMS, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jing, Lei Santa Clara, US 33 82
Karim, M Ziaul San Jose, US 37 1928
Sautter, Kenneth Sunnyvale, US 7 2
Song, Kang San Jose, US 16 63

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