OBSERVATION APPARATUS, OBSERVATION METHOD, AND DISTANCE MEASUREMENT SYSTEM

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United States of America Patent

APP PUB NO 20230046614A1
SERIAL NO

17758293

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present technology relates to an observation apparatus, an observation method, and a distance measurement system capable of improving distance measurement accuracy. A first measurement unit that measures a first number of reactions of a light receiving element in response to incidence of photons on a first pixel, a second measurement unit that measures a second number of reactions of the light receiving element in response to incidence of photons on a second pixel, a light emitting unit that emits light to the second pixel, and a light emission control unit that controls the light emitting unit according to a difference between the first number of reactions and the second number of reactions are included. The present technology can be applied to, for example, a distance measurement apparatus that measures a distance to a predetermined object, and can be applied to an observation apparatus that observes a characteristic of a pixel included in the distance measurement apparatus.

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Patent Owner(s)

Patent OwnerAddress
SONY SEMICONDUCTOR SOLUTIONS CORPORATION4-14-1 ASAHICHO ATSUGI-SHI KANAGAWA 2430014

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
TSUKUDA, YASUNORI KANAGAWA, JP 50 198

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