HIGHLY EFFICIENT FAR UV FILTRATION SYSTEM
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United States of America Patent
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Issued Date -
Feb 9, 2023
app pub date -
Oct 24, 2022
filing date -
Oct 24, 2022
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Abstract
A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.
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