PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USING THE SAME, AND ELECTRON BEAM EXPOSURE APPARATUS
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United States of America Patent
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Feb 9, 2023
app pub date -
Feb 24, 2022
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Feb 24, 2022
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Abstract
According to example embodiments, there is provided a photoresist inspection method. The photoresist inspection method includes: providing a photoresist on a substrate; irradiating the photoresist with an electron beam and an excitation beam; detecting fluorescent light generated by the photoresist in response to the excitation beam; and evaluating the photoresist based on the fluorescent light.
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