ENVIRONMENTALLY FRIENDLY PHOTORESIST REMOVING COMPOSITION AND METHOD FOR USING THE SAME

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United States of America Patent

APP PUB NO 20230038651A1
SERIAL NO

17814534

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Abstract

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An environmentally friendly photoresist removing composition includes 20 parts by weight to 80 parts by weight of a carbonate compound, 0.5 parts by weight to 15 parts by weight of a hydramine compound, an amide compound, or an ammonium compound, 1 part by weight to 20 parts by weight of an organic base compound, and 2 parts by weight to 70 parts by weight of an alcohol ether compound.

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Patent OwnerAddress
YUANHAN MATERIALS INC15F NO 51 SEC 2 CHONGQING S RD ZHONGZHENG DIST TAIPEI CITY 100057

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, En-Ming Taipei City, TW 1 0
SHA, Sheng-Chun Taipei City, TW 1 0
YU, Feng-Chao Taipei City, TW 2 0
YU, Hung-Chun Taipei City, TW 2 0

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