SEMICONDUCTOR PROCESSING CHAMBER ADAPTER
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United States of America Patent
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Issued Date -
Jan 5, 2023
app pub date -
Jul 2, 2021
filing date -
Jul 2, 2021
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Abstract
Exemplary semiconductor processing systems may include a processing chamber. The systems may include a remote plasma unit coupled with the processing chamber. The systems may include an adapter coupled between the remote plasma unit and the processing chamber. The adapter may be characterized by a first end and a second end opposite the first end. The remote plasma unit may be coupled with the adapter at the first end. The adapter may define a first central channel extending more than 50% of a length of the adapter from the first end of the adapter. The adapter may define a second central channel extending less than 50% of the length of the adapter from the second end of the adapter. The adapter may define a transition between the first central channel and the second central channel.
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