PATTERN-EDGE DETECTION METHOD, PATTERN-EDGE DETECTION APPARATUS, AND STORAGE MEDIUM STORING PROGRAM FOR CAUSING A COMPUTER TO PERFORM PATTERN-EDGE DETECTION
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United States of America Patent
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Issued Date -
Jan 5, 2023
app pub date -
Dec 10, 2020
filing date -
Dec 10, 2020
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Abstract
The present invention relates to a method of detecting an edge (or a contour line) of a pattern, which is formed on a workpiece (e.g., a wafer or a mask) for use in manufacturing of semiconductor, from an image generated by a scanning electron microscope. The pattern-edge detection method includes: generating an objective image of a target pattern formed on a workpiece; generating a feature vector representing features of each pixel constituting the objective image; inputting the feature vector to a model constructed by machine learning; outputting, from the model, a determination result indicating whether the pixel having the feature vector is an edge pixel or a non-edge pixel; and connecting a plurality of pixels, each having a feature vector that has obtained a determination result indicating an edge pixel, with a line to generate a virtual edge.
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