PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS
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United States of America Patent
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Dec 29, 2022
app pub date -
Sep 9, 2020
filing date -
Sep 9, 2020
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Abstract
Embodiments described herein generally relate to a processing system and a method of delivering a reactant gas. The processing system includes a substrate support system, an injection cone, and an intake. The injection cone includes a linear rudder. The linear rudder is disposed such that the flow of reactant gas through the injection cone results in film growth on a specific portion of a substrate. The method includes flowing the gas through the injection cone and delivering the gas onto the substrate below. The localization of the reactant gas, allows for film growth on a specific portion of the substrate.
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