ELECTRON SOURCE FOR GENERATING AN ELECTRON BEAM
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United States of America Patent
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Dec 22, 2022
app pub date -
Jul 31, 2020
filing date -
Jul 31, 2020
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Abstract
An electron source (2) for generating an electron beam (8) having a cathode (1) and an anode (4) in the form of a graphene layer (6, 12) epitaxially grown on a silicon carbide substrate (5). The invention is suitable for monolithic preparation of a miniaturized source of a high-energy focused electron beam, including its use as an on-chip X-ray source. All components can be prepared from or on a single silicon carbide chip.
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