WAFER BATH IMAGING
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United States of America Patent
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Issued Date -
Dec 22, 2022
app pub date -
Jun 16, 2021
filing date -
Jun 16, 2021
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Abstract
An exemplary method of monitoring a bath process includes processing a first wafer by submerging the first wafer within a bath solution; capturing a video of the bath solution containing the first wafer during a first time interval; analyzing the video based on intensity of light captured in a frame of the video; and based on analyzing the video, determining a first metric of the bath solution during the first time interval.
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