CRITICAL DIMENSION ERROR ANALYSIS METHOD
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Dec 15, 2022
app pub date -
Jul 23, 2020
filing date -
Jul 23, 2020
priority date (Note) -
Published
status (Latency Note)
![]() |
A preliminary load of PAIR data current through [] has been loaded. Any more recent PAIR data will be loaded within twenty-four hours. |
PAIR data current through []
A preliminary load of cached data will be loaded soon.
Any more recent PAIR data will be loaded within twenty-four hours.
![]() |
Next PAIR Update Scheduled on [ ] |

Importance

US Family Size
|
Non-US Coverage
|
Abstract
The present invention disclosures a critical dimension error analysis method, comprising: S01: performing lithography processes on a wafer, measuring the critical dimension (CD) values of the test points in each of the fields respectively; M and N are integers greater than 1; S02: removing extreme outliers from the critical dimension (CD) values; S03: rebuilding remaining CD values by a reconstruction model fitting method, and obtaining rebuilt critical dimension (CD″) values, according to relative error between CD″ and CD, dividing the rebuilt critical dimension (CD″) values into scenes and the number of the scenes is A; S04: calculating components and corresponding residuals of the test points in each of the scenes under a reference system corresponding to a correction model by parameter estimation; S05: modifying machine parameters and masks by the correction model according to above calculation results. The present invention uses an outer limit to remove extreme outliers, so as to analyze a critical dimension error during a lithography process quickly and accurately.
First Claim
all claims..Other Claims data not available
Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
CN | B | CN111146104 | Nov 29, 2019 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT FOR INVENTION | Method for analyzing critical dimension error | Sep 05, 2023 | |||
WO | A1 | WO2021103602 | Jul 23, 2020 | Patent | Application |
Type : Patent Sub-Type : Application | |||||
INTERNATIONAL APPLICATION PUBLISHED WITH INTERNATIONAL SEARCH REPORT | 一种关键尺寸误差分析方法 | Jun 03, 2021 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SHANGHAI IC R&D CENTER CO LTD | SHANGHAI |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
DUAN, Jiebin | Shanghai, CN | 5 | 3 |
# of filed Patents : 5 Total Citations : 3 | |||
FU, Hao | Shanghai, CN | 23 | 6 |
# of filed Patents : 23 Total Citations : 6 | |||
GUO, Lingyi | Shanghai, CN | 4 | 1 |
# of filed Patents : 4 Total Citations : 1 | |||
LI, Chen | Shanghai, CN | 352 | 2814 |
# of filed Patents : 352 Total Citations : 2814 | |||
LI, Liren | Shanghai, CN | 5 | 36 |
# of filed Patents : 5 Total Citations : 36 | |||
SUN, Hongxia | Shanghai, CN | 13 | 27 |
# of filed Patents : 13 Total Citations : 27 | |||
WANG, Pengfei | Shanghai, CN | 172 | 398 |
# of filed Patents : 172 Total Citations : 398 | |||
WANG, Xiucui | Shanghai, CN | 1 | 0 |
# of filed Patents : 1 Total Citations : 0 | |||
XU, Bowen | Shanghai, CN | 4 | 12 |
# of filed Patents : 4 Total Citations : 12 | |||
YAN, Yan | Shanghai, CN | 189 | 1440 |
# of filed Patents : 189 Total Citations : 1440 | |||
YU, Xueru | Shanghai, CN | 2 | 0 |
# of filed Patents : 2 Total Citations : 0 | |||
ZHOU, Tao | Shanghai, CN | 131 | 554 |
# of filed Patents : 131 Total Citations : 554 |
Cited Art Landscape
- No Cited Art to Display

Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 3 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Jun 15, 2026 |
7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jun 15, 2030 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jun 15, 2034 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 3.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text

Legal Events
- No Legal Status data available.

Matter Detail

Renewals Detail
