PHOTOMASK, METHOD OF MANUFACTURING ARRAY SUBSTRATE, AND DISPLAY PANEL
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United States of America Patent
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Issued Date -
Dec 15, 2022
app pub date -
Dec 31, 2020
filing date -
Dec 31, 2020
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask, a method of manufacturing an array substrate, and a display panel are provided. The photomask includes a photomask line of a first conductive portion, a photomask line of a second conductive portion spaced apart from the photomask line of the first conductive portion, and a bridging line. Two opposite ends of the bridging line are respectively connected to the photomask line of the first conductive portion and the photomask line of the second conductive portion, and a width of the bridging line is less than a preset width.
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