Phase shift mask for EUV lithography and manufacturing method for the phase shift mask
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United States of America Patent
Stats
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Jul 2, 2024
Grant Date -
Dec 15, 2022
app pub date -
Nov 17, 2021
filing date -
Nov 17, 2021
priority date (Note) -
In Force
status (Latency Note)
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Abstract
There is provided a phase shift mask for extreme-ultraviolet lithography and a method of manufacturing the phase shift mask. The phase shift mask includes a substrate, a reflective layer, device patterns, a frame pattern, or phase shift patterns. The frame pattern is a pattern that includes alignment holes exposing portions of the reflective layer. The phase shift patterns overlap with the device patterns.
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International Classification(s)
- 2021 Application Filing Year
- G03F Class
- 1993 Applications Filed
- 1000 Patents Issued To-Date
- 50.18 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 1 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Jan 2, 2028 |
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jan 2, 2032 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jan 2, 2036 |
