CERTAIN IMPROVEMENTS OF MULTI-BEAM GENERATING AND MULTI-BEAM DEFLECTING UNITS
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United States of America Patent
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Issued Date -
Dec 8, 2022
app pub date -
Aug 18, 2022
filing date -
Aug 18, 2022
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Abstract
Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.
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