COMPOSITION FOR MEMORY CELL CONTAINING CHALCOGEN COMPOUND, STRUCTURE THEREOF, METHOD FOR MANUFACTURING SAME, AND METHOD FOR OPERATING SAME

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United States of America Patent

APP PUB NO 20220367808A1
SERIAL NO

17774191

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Abstract

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An object of the present invention is to provide a composition, a memory structure suitable for the composition, a manufacturing method, and an operating method for stable operation in a memory element including a chalcogen compound. In order to achieve the object, in a memory array with a cross-point structure including a first electrode line and a second electrode line intersecting each other, and a selective memory element disposed at each intersection of the first electrode line and the second electrode line and being a chalcogen compound, the present invention may provide the memory array with a cross-point structure including the first electrode line formed on a substrate, a first functional electrode formed between the first electrode line and the selective memory element, and a second functional electrode formed between the second electrode line and the selective memory element, wherein the first functional electrode is formed as a line along the first electrode line.

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Patent Owner(s)

Patent OwnerAddress
IHW INCA-1314 767 SINSU-RO SUJI-GU GYEONGGI-DO YONGIN-SI 16827

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KIM, Jun-sung Seongnam-si, KR 11 11
LEE, Seung-hwan Ann Arbor, US 198 4491
YOON, Sang-hoon Seongnam-si, KR 20 85

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