SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE
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United States of America Patent
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Nov 17, 2022
app pub date -
Oct 12, 2020
filing date -
Oct 23, 2019
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Abstract
A substrate cleaning method includes: supplying a gas mixture of a cluster forming gas for forming a cluster by adiabatic expansion and a carrier gas having a smaller molecular weight or atomic weight than the cluster forming gas to a nozzle; forming the cluster by injecting the gas mixture from the nozzle; removing particles adhering to the substrate by the cluster; and continuously supplying the carrier gas to the nozzle for a set time period from an end time of the supply of the cluster forming gas to the nozzle.
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