PHOTOMASK BLANK AND PHOTOMASK USING THE SAME

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United States of America Patent

APP PUB NO 20220350237A1
SERIAL NO

17729466

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Disclosed is a photomask comprising: a transparent substrate; and a multi-layer light shielding pattern film disposed on the transparent substrate, wherein the multi-layer light shielding pattern film comprises: a first light shielding film; and a second light shielding film disposed on the first light shielding film and comprising a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface roughness Wr of the measuring zone satisfies Equation 1 below:

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Patent Owner(s)

Patent OwnerAddress
SK ENPULSE CO LTDPYEONGTAEK-SI GYEONGGI-DO 17784

International Classification(s)

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  • 2022 Application Filing Year
  • G01B Class
  • 1437 Applications Filed
  • 599 Patents Issued To-Date
  • 41.69 % Issued To-Date

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHOI, Suk Young Suwon-si, KR 25 52
JEONG, Min Gyo Suwon-si, KR 24 0
KIM, Kyuhun Suwon-si, KR 17 2
KIM, Seong Yoon Suwon-si, KR 30 28
KIM, Suhyeon Suwon-si, KR 42 397
LEE, Hyung-joo Suwon-si, KR 41 577
SHIN, Inkyun Suwon-si, KR 30 6
SON, Sung Hoon Suwon-si, KR 29 107

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges179187810101 - 1011 - 2041 - 5001002003004005006007008009001000110012001300140015001600170018001900

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