Substrate treating apparatus and substrate treating method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12080566
APP PUB NO 20220344176A1
SERIAL NO

17640858

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Abstract

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A substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a treating unit and a controller. The treating unit includes a substrate holder, a rotation driving unit, a treatment liquid supplying unit, a liquid collecting unit, and a guard driving unit. The substrate holder holds a substrate in a horizontal posture. The rotation driving unit rotates the substrate holder. The liquid collecting unit includes a first guard, a second guard, and a liquid inlet. The first guard and the second guard are arranged so as to surround the substrate holder laterally. The liquid inlet is defined by the guards. The liquid inlet is open toward the substrate held by the substrate holder. The guard driving unit moves the second guard in a vertical direction. The controller controls the guard driving unit in accordance with the shape of the substrate held by the substrate holder, thereby changing a height position of an upper end of the liquid inlet.

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Patent Owner(s)

Patent OwnerAddress
SCREEN HOLDINGS CO LTDTENJINKITA-MACHI 1-1 TERANOUCHI-AGARU 4-CHOME HORIKAWA-DORI KAMIGYO-KU KYOTO-SHI KYOTO 602-8585

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akizuki, Yusuke Kyoto, JP 5 3
Hinode, Taiki Kyoto, JP 23 120
Honsho, Kazuhiro Kyoto, JP 9 28
Ota, Takashi Kyoto, JP 151 1095
Takahashi, Mitsukazu Kyoto, JP 14 650

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