CONTROL VALVE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
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United States of America Patent
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Issued Date -
Oct 13, 2022
app pub date -
Jun 23, 2022
filing date -
Feb 4, 2020
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Abstract
There is provided a technique that includes: a gate valve including a movable gate valve plate; and a butterfly valve that is installed at the gate valve plate, has a diameter smaller than those of valve openings configured to be opened or closed by the gate valve plate, and is configured to be capable of being fully closed, wherein the gate valve plate of the gate valve and the butterfly valve are configured to be capable of being driven independently of each other.
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