PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK
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United States of America Patent
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Issued Date -
Oct 6, 2022
app pub date -
Mar 22, 2022
filing date -
Apr 6, 2021
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Abstract
A photomask blank including a substrate and chromium-containing film, where the chromium-containing film has first to third layers from a substrate side remote, each containing chromium. The first layer contains oxygen and nitrogen and has 44 atom % or less chromium, 30 atom % or more oxygen, 26 atom % or less nitrogen, and thickness of 8 to 20 nm. The second layer contains nitrogen and 66 to 92 atom % Cr, 8 to 34 atom % N, and thickness of 40 to 70 nm. The third layer further contains oxygen and nitrogen and has 44 atom % or less Cr, 30 atom % or more O, 26 atom % or less N, and thickness of 10 nm or less. Thus, a photomask blank has a chromium-containing film with good surface roughness with defects of 50 nm, low resistivity for foreign matter adherence, and reads a barcode pattern.
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