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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
TOUNETSU CO LTD	FUJINOMIYASHI SHIZUOKA 4180007

International Classification(s)

• C22B:PRODUCTION OR REFINING OF METALS
• F27B:FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPE....
• F27D:DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, ....

• 2020 Application Filing Year
• C22B Class
• 267 Applications Filed
• 123 Patents Issued To-Date
• 46.07 % Issued To-Date

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Iwamoto, Tomihiro	Shizuoka, JP	3	0
# of filed Patents : 3 Total Citations : 0
Mochizuki, Kiyata	Shizuoka, JP	10	8
# of filed Patents : 10 Total Citations : 8

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• C22B Class

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Full Text

US Patent Application No: 2014/0138,135

SILICON/GERMANIUM PARTICLE INKS, DOPED PARTICLES, PRINTING AND PROCESSES FOR SEMICONDUCTOR APPLICATIONS

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Abstract

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Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.

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Description

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