ALD preparation method for eliminating camera module dot defects and product thereof

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United States of America Patent

PATENT NO 11804501
APP PUB NO 20220302200A1
SERIAL NO

16969573

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Abstract

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An ALD preparation method for eliminating camera module dot defects includes: placing a base substrate in a reaction chamber, and heating to 100-400° C.; introducing a first reaction precursor into the reaction chamber to chemically adsorb the first reaction precursor on the base substrate to form a first film layer; removing the excess first reaction precursor, and purging with inert gas; introducing a second reaction precursor into the reaction chamber to create a reaction between the second reaction precursor and the first reaction precursor to form a first refractive index layer; removing the excess second reaction precursor and a by-product of the reaction, and purging with inert gas; introducing a third reaction precursor into the reaction chamber to chemically adsorb the third reaction precursor on a surface of the first refractive index layer to form a second film layer; and removing the excess third reaction precursor, and purging with inert gas.

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Patent Owner(s)

Patent OwnerAddress
HANGZHOU MDK OPTO ELECTRONICS CO LTD578# NO 20 STREET HANGZHOU ECONO&TECH DEVELOPMENT ZONE ZHEJIANG HANGZHOU 310018

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ge, Wenzhi Hangzhou, CN 5 2
Jiang, Junnan Hangzhou, CN 2 1
Wang, Gang Hangzhou, CN 1411 9119
Wang, Yiwei Hangzhou, CN 35 50
Weng, Kevin Hangzhou, CN 7 16
Yajima, Hirokazu Hangzhou, CN 6 10

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