CVD preparation method for minimizing camera module dot defects and product thereof

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United States of America Patent

PATENT NO 12034020
APP PUB NO 20220302193A1
SERIAL NO

16969572

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Abstract

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A CVD preparation method for minimizing camera module dot defects includes: performing ultrasonic cleaning and drying on a base substrate to obtain a pre-treated base substrate; placing the pre-treated base substrate into a reaction chamber, evacuating, and introducing nitrogen or inert gas to slightly positive pressure; simultaneously introducing precursor I and precursor II at a temperature of 500-700° C. to deposit a low-refractive-index L layer on the base substrate; halting introduction of the precursor I and the precursor II, and purging the reaction chamber with nitrogen or the inert gas; introducing raw gas precursor III and precursor IV at a temperature of 600-800° C. to deposit a high-refractive-index H layer on the low-refractive-index L layer; and halting introduction of the precursor III and precursor IV, and purging the reaction chamber with nitrogen or inert gas; and cooling to room temperature to obtain an optical element with coating films having different refractive indices.

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Patent Owner(s)

Patent OwnerAddress
HANGZHOU MDK OPTO ELECTRONICS CO LTD578# NO 20 STREET HANGZHOU ECONO&TECH DEVELOPMENT ZONE ZHEJIANG HANGZHOU 310018

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ge, Wenzhi Hangzhou, CN 5 2
Jiang, Junnan Hangzhou, CN 2 1
Wang, Gang Hangzhou, CN 1411 9119
Wang, Yiwei Hangzhou, CN 35 50
Weng, Kevin Hangzhou, CN 7 16
Yajima, Hirokazu Hangzhou, CN 6 10

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