GAS CONTROL METHOD AND RELATED USES

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United States of America Patent

APP PUB NO 20220285902A1
SERIAL NO

17641142

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a gas control system and method for online control of a gas compartment of a radiation source. The method includes measuring a parameter of a radiation source such as an excimer laser, the parameter describing an electrical stimulation applied to the laser and/or a characteristic of radiation generated by the laser and/or an amount of a consumable in the gas compartment. A function of the parameter is compared a to a threshold and if the parameter breaches the threshold, an amount of gas is calculated based on the parameter. An instruction is provided to provide or remove the amount of gas to or from, the gas compartment. Gases may be injected or bled into the compartment during use of the radiation source thereby reducing or negating the need to take the radiation source offline to purge and refill the gas compartment.

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Patent Owner(s)

Patent OwnerAddress
CYMER LLC17075 THORNMINT COURT SAN DIEGO CA 92127

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Zhao, Yingbo San Diego, US 11 2

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