Importance

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Abstract

A semiconductor memory device includes a substrate that includes a first region and a second region. The first region includes: a plurality of first word line layers; a first semiconductor layer having an outer peripheral surface opposed to the plurality of first word line layers; and a first electric charge accumulating film disposed between the plurality of first word line layers and the first semiconductor layer. The second region includes: a part of the plurality of first word line layers; a plurality of first insulating layers, the plurality of first insulating layers; a first contact having an outer peripheral surface opposed to the plurality of first insulating layers; a second semiconductor layer disposed between the plurality of first word line layers and the plurality of first insulating layers; and a second electric charge accumulating film disposed between the plurality of first insulating layers and the second semiconductor layer.

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First Claim