EDGE RING SYSTEMS FOR SUBSTRATE PROCESSING SYSTEMS
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United States of America Patent
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Sep 8, 2022
app pub date -
Jul 30, 2020
filing date -
Aug 5, 2019
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Abstract
An edge ring system for a substrate processing system includes a top edge ring including an annular body having an inner diameter and an outer diameter. The outer diameter of the top edge ring is smaller than a horizontal opening of a substrate port of the substrate processing system. A first edge ring is arranged below the top edge ring including an annular body having an inner diameter and an outer diameter. The outer diameter of the first edge ring is larger than the substrate port of the substrate processing system. The inner diameter of the first edge ring is smaller than the inner diameter of the top edge ring.
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