DEVICE FOR MEASURING A SUBSTRATE AND METHOD FOR CORRECTING CYCLIC ERROR COMPONENTS OF AN INTERFEROMETER
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United States of America Patent
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Issued Date -
Aug 18, 2022
app pub date -
May 5, 2022
filing date -
Nov 14, 2019
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Abstract
The invention relates to a device for measuring a substrate for semiconductor lithography with a reference interferometer for ascertaining the change in the ambient conditions, wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer, wherein the means is configured to bring about a change in the refractive index.
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