Reflective mask blank and reflective mask

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United States of America Patent

PATENT NO 11914283
APP PUB NO 20220236636A1
SERIAL NO

17658763

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Abstract

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A reflective mask blank includes a substrate and, on or above the substrate in order, a reflective layer for reflecting EUV light, a protective layer for protecting the reflective layer, and an absorbent layer for absorbing EUV light. The absorbent layer has a reflectance for a wavelength of 13.53 nm of from 2.5% to 10%. A film thickness d of the absorbent layer satisfies a relationship of:

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Patent Owner(s)

Patent OwnerAddress
AGC INC5-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8405

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hanekawa, Hiroshi Tokyo, JP 24 82
Tanabe, Hiroyoshi Tokyo, JP 20 307
Uno, Toshiyuki Tokyo, JP 32 319

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