SINGLE CRYSTAL CATHODE MATERIALS USING MICROWAVE PLASMA PROCESSING

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United States of America Patent

APP PUB NO 20220228288A1
SERIAL NO

17577797

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Abstract

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Disclosed herein are systems and methods for synthesis of submicron-scale or micron-scale single crystal cathode (SCC) material, such as NMC, using a feedstock and microwave plasma processing. Microwave plasma processing of these SCC materials provides a low cost, scalable approach. In some embodiments, advanced SCC materials may be synthesized through microwave plasma processing of feedstock materials, wherein the SCC materials may comprise at least 80% nickel. In some embodiments, the microwave plasma processing may enable synthesis of SCC materials with very short calcination.

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Patent OwnerAddress
6K INC25 COMMERCE WAY NORTH ANDOVER MA 01845

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
COLWELL, JOHN DURHAM, US 8 42
HOLMAN, RICHARD K WELLESLEY, US 41 1920
PULLEN, ADRIAN BOSTON, US 8 50
WROBEL, GREGORY M WEST NEWBURY, US 9 102

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