Droplet deposition apparatus
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United States of America Patent
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Oct 25, 2022
Grant Date -
Jul 14, 2022
app pub date -
Nov 25, 2019
filing date -
May 31, 2019
priority date (Note) -
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status (Latency Note)
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Abstract
A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.
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