METHOD FOR DOSING A TARGET COMPONENT

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United States of America Patent

APP PUB NO 20220214207A1
SERIAL NO

17613235

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention relates to a method for dosing a target component (20), wherein a dosing system (10) doses the target component (20) to a target value (Z20), which corresponds to a desired nominal value (S20soll), wherein an additional dosing system (12) doses at least one additional component (21, 22, 23) to be follow-on dosed, to a target value (Z21) of the component (21, 22, 23) to be follow-on dosed which is lower than a desired nominal value (S21soll) of the component (21, 22, 23) to be follow-on dosed, wherein an actual value (G20ist) of the target component (20) and at least one actual value (G21ist) of the component (21, 22, 23) to be follow-on dosed are then determined, a content (A) of the target component (20) then being calculated according to the actual value (G20ist) of the target component (20) and/or the actual value (G21ist) of the component (21, 22, 23) to be follow-on dosed and the content (A) being compared to a limit value (T) or tolerance band (T), at least the component (21, 22, 23) to be follow-on dosed being additionally dosed in the event of the limit value (T) or tolerance band (T) being exceeded.

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Patent Owner(s)

Patent OwnerAddress
HUTTLIN GMBH79650 SCHOPFHEIM

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Azher, Syed Muhammad Mushahid Weil Am Rhein, DE 2 1
Gebauer, Christian Kandern, DE 12 26
Hemming, Isabelle Schopfheim, DE 1 0
Michaelis, Marc Lörrach, DE 5 9
Paasche, Christian Karl Bad Säckingen, DE 6 2

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