DEVICE AND METHOD FOR COATING SUBSTRATES HAVING PLANAR OR SHAPED SURFACES BY MEANS OF MAGNETRON SPUTTERING
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United States of America Patent
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Jul 7, 2022
app pub date -
Apr 9, 2020
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Apr 9, 2019
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Abstract
According to the invention, a device is provided for coating substrates having planar or shaped surfaces by means of magnetron sputtering, by means of which device surfaces having any shape, for examples lenses, aspheres or freeform surfaces which have an adjustable layer-thickness profile, can be coated such that a layer function is maintained on the substantially complete surface. A method for coating substrates having planar or shaped surfaces by means of magnetron sputtering is also provided.
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