METHOD FOR PRODUCING SUBSTANCE WITH MODIFIED CARBON ALLOTROPE SURFACE, METHOD FOR PRODUCING SUBSTANCE WITH CARBON ALLOTROPE SURFACE INTO WHICH FUNCTIONAL GROUP IS INTRODUCED, METHOD FOR PRODUCING GRID FOR CRYO-ELECTRON MICROSCOPY, ORGANIC SUBSTANCE, AND GRID FOR CRYO-ELECTRON MICROSCOPY

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20220204346A1
SERIAL NO

17441971

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Abstract

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The present invention provides a method for producing a substance with a modified carbon allotrope surface that can suppress or prevent uneven distribution, uneven orientation, and the like of a structural analysis target substance in a structural analysis by cryo-electron microscopy. A method for producing a substance with a modified carbon allotrope surface of the present invention includes: the step of surface-treating by reacting a carbon allotrope surface with a halogen oxide radical, wherein the carbon allotrope surface is modified by the surface-treating.

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Patent Owner(s)

Patent OwnerAddress
OSAKA UNIVERSITY1-1 YAMADAOKA SUITA-SHI OSAKA 5650871 ?5650871

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ADACHI, Hiroaki Osaka, JP 59 452
ASAHARA, Haruyasu Osaka, JP 7 2
DOI, Takefumi Osaka, JP 4 0
HIROSE, Mika Osaka, JP 1 0
INOUE, Tsuyoshi Osaka, JP 156 1391
IWASAKI, Kenji Osaka, JP 37 318
MIYAZAKI, Naoyuki Osaka, JP 5 73
NAKAGAWA, Atsushi Osaka, JP 120 3288
OHKUBO, Kei Osaka, JP 12 13
TAKAGI, Junichi Osaka, JP 69 732

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