PHOTOSENSITIVE COMPOSITION
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United States of America Patent
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Issued Date -
Jun 2, 2022
app pub date -
Nov 10, 2021
filing date -
Nov 10, 2021
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Abstract
A photosensitive composition of a developable relief precursor, comprising: at least one copolymer as component C, at least one ethylenically unsaturated compound as component U, at least one photoinitiator or photoinitiator system as component P, at least one water soluble and/or water dispersible binder as component B, wherein the at least one copolymer as component C is an at least partially hydrolyzed ethylene vinyl acetate copolymer, comprising —CH2—CH2— groups and wherein the content of said —CH2—CH2— groups in the partially hydrolyzed ethylene vinyl acetate copolymer is lower than 20 mol %, preferably lower than 15 mol %, more preferably lower than 10 mol %.
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