Reflective mask and fabricating method thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11630386
APP PUB NO 20220146924A1
SERIAL NO

17579433

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Abstract

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The prevent disclosure provides a reflective mask. In some embodiments, the reflective mask includes a substrate, a sp2-hybrid carbon layer, a reflective multilayer, and an absorption pattern. The sp2-hybrid carbon layer is over the substrate. The reflective multilayer is over the sp2-hybrid carbon layer. The absorption pattern is over the reflective multilayer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Pei-Cheng Taipei, TW 111 530
Wu, Tsiao-Chen Hsinchu County, TW 26 431

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