PHOTOMASK, METHOD FOR PRODUCING PHOTOMASK, AND METHOD FOR PRODUCING COLOR FILTER USING PHOTOMASK
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United States of America
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Issued Date -
Mar 31, 2022
app pub date -
Dec 9, 2021
filing date -
Dec 9, 2021
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Abstract
A photomask is used for scanning type projection exposure provided with a projection lens assembly composed of a lens assembly. A line width in a plurality of patterns of the photomask in a region to be transferred by performing scanning exposure including connecting portions of the lens assembly are corrected with respect to a line width of patterns which are the same as the patterns of the photomask present in a region to be transferred by performing scanning exposure but do not include the connecting portions.
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