TEMPLATE, MANUFACTURING METHOD OF TEMPLATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
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United States of America
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Issued Date -
Mar 17, 2022
app pub date -
Mar 2, 2021
filing date -
Mar 2, 2021
priority date (Note) -
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Abstract
According to one embodiment, an imprint template includes a substrate having a first surface and a mesa part protruding from the first surface. The mesa part has a second surface with a pattern thereon. The mesa part includes a sloped region. The sloped region is on at least an outer circumferential portion of the second surface. The second surface in the sloped region slopes downward towards the first surface to an outer edge of the mesa part when the substate is in a non-pressurized state.
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