METROLOGY METHOD, TARGET AND SUBSTRATE

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20220057192A1
SERIAL NO

17519641

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Abstract

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A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL - 5504 DR

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ADAM, Omer Abubaker Omer Eindhoven, NL 14 249
BELTMAN, Johannes Marcus Maria Knegsel, NL 7 64
BHATTACHARYYA, Kaustuve Veldhoven, NL 65 835
DEN, BOEF Arie Jeffrey Waalre, NL 263 4891
FOUQUET, Christophe David Retie, BE 11 117
FUCHS, Andreas Meerbusch, DE 85 972
JAK, Martin Jacobus Johan 's-Hertogenbosch, NL 74 575
KUBIS, Michael Meerbusch, DE 32 916
LIU, Xing Lan Veldhoven, NL 18 121
SMILDE, Hendrik Jan Hidde Veldhoven, NL 40 1878
VAN, BUEL Henricus Wilhelmus Maria 's-Hertogenbosch, NL 38 238
VAN, DER SCHAAR Maurits Eindhoven, NL 138 1999
VAN, HAREN Richard Johannes Franciscus Waalre, NL 103 789

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